Tech Stack

Description

You will analyze leakage mechanisms in flowable low-k SiOCH films using I–V measurements and structural analysis (FTIR/XPS), correlating material structure with leakage behavior. Your work will involve dummy samples, DOE experiments, and data analysis to support semiconductor process development.

Requirements

• Background in Materials Science, Chemical Engineering, Applied Physics, or related field
• Experience with electrical measurements or materials characterization preferred
• Master's or PhD student eligible
• Skills: Electrical measurement (I–V testing), Materials analysis (FTIR, XPS), Data analysis and problem-solving

Responsibilities

• Perform I–V/C-V testing to identify leakage models (e.g., Poole-Frenkel, tunneling)
• Use FTIR/XPS to evaluate bonding states and composition
• Design two-factor DOE experiments (e.g., temperature × cure time)
• Analyze data focusing on model fitting and correlation between structural and electrical properties
• Deliver results reviewed and masked for IP compliance